Cleaning systems and base stations for cleaning systems

A technology for cleaning systems and base stations, applied in the field of cleaning systems and base stations of cleaning systems, can solve problems such as inability to dry quickly and automatic control, and achieve the effect of accelerating drying efficiency

Pending Publication Date: 2020-03-17
POSITEC POWER TOOLS (SUZHOU) CO LTD
View PDF0 Cites 45 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The cleaning robot in the related art needs to clean the flannelette and/or the roller brush when it is dirty after cleaning the floor, but it cannot dry it quickly after the flannel cloth and/or roller brush are cleaned, nor can it realize automatic control. Therefore, there is a need for improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cleaning systems and base stations for cleaning systems
  • Cleaning systems and base stations for cleaning systems
  • Cleaning systems and base stations for cleaning systems

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0036] The embodiments of the present invention will be described in detail below. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals indicate the same or similar elements or elements with the same or similar functions. The embodiments described below with reference to the drawings are exemplary, and are only used to explain the present invention, but should not be understood as limiting the present invention.

[0037] Reference below Figure 1-Figure 5 The base station 100 of the cleaning system according to the embodiment of the present invention is described.

[0038] Such as Figure 1 to Figure 5 As shown, the base station 100 of the cleaning system according to the embodiment of the present invention includes a supporting table 11 and a drying assembly (not shown in the figure).

[0039] The supporting table 11 is used to support the cleaning robot 200. The supporting table 11 has a cleaning tank 111 with an open top.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a cleaning system and a base station of the cleaning system. The base station includes: a support platform for supporting a cleaning robot, the support platform has a cleaning tank with an open top, and the cleaning tank is used to hold water to clean the cleaning robot located above it. Flannel and/or roller brush, the cleaning tank has a water inlet and a sewage outlet; a drying component for generating hot air, the drying component is connected with the cleaning tank, and the hot air generated by the drying component is directed to the cleaning tank to dry the cleaned Clean the robot's lint and/or brush. According to the base station of the cleaning system according to the embodiment of the present invention, by setting the drying component, the flannelette and/or roller brush of the cleaning robot can be dried after cleaning, thereby speeding up the drying efficiency of the flannelette and/or roller brush, preventing the The flannel and/or roller brush dripping water on the floor will affect the effect of cleaning the floor.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner POSITEC POWER TOOLS (SUZHOU) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap