Carbonization of metal caps

Active Publication Date: 2008-10-16
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0012]The advantageous features of the present invention include improved stability of the contacts between copper lines and vias,

Problems solved by technology

However, copper still suffers from electro migration (EM) and stress migration (SM) reliability issues as geometries continue to shrink and current densities i

Method used

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  • Carbonization of metal caps
  • Carbonization of metal caps
  • Carbonization of metal caps

Examples

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Embodiment Construction

[0018]The making and using of the presently preferred embodiments are discussed in detail below. It should be appreciated, however, that the present invention provides many applicable inventive concepts that can be embodied in a wide variety of specific contexts. The specific embodiments discussed are merely illustrative of specific ways to make and use the invention, and do not limit the scope of the invention.

[0019]Interconnect structures comprising metal carbide layers and methods of forming the same are provided. The intermediate stages of manufacturing preferred embodiments of the present invention are illustrated in FIGS. 3 through 8B. Variations are then discussed. Throughout various views and illustrative embodiments of the present invention, like reference numbers are used to designate like elements.

[0020]FIG. 3 illustrates the formation of opening 26 in dielectric layer 20, which is formed over a schematically illustrated base structure 18. Base structure 18 may include a sem

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Abstract

An integrated circuit structure includes a semiconductor substrate; a dielectric layer over the semiconductor substrate; a conductive wiring in the dielectric layer; and a metal carbide cap layer over the conductive wiring.

Description

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Claims

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Application Information

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Owner TAIWAN SEMICON MFG CO LTD
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