Station and method for measuring particulate contamination of a transport chamber for conveying and atmospherically storing semiconductor substrates

A technology of atmospheric pressure and measurement methods, applied in individual particle analysis, semiconductor/solid-state device manufacturing, measurement devices, etc.

Active Publication Date: 2015-07-29
PFEIFFER VACUUM GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The invention relates to an injector that controls how far it's from its target location inside a device called the rigging system. By controlling this distance with certain shapes on the measurement tool, optimal performance may result for better control over the process or prevent damage during use.

Problems solved by technology

Technological Problem: Transport containers like wafer carriers require periodic cleanings due to their use without causing any harmful effects on the products they hold. Current methods involve manual cleaning and testing each container separately, but there may still exist issues where individual units cannot accurately determine if they should be cleanled properly. Additionally, current solutions only provide limited data about how much particulate matter accumulators inside the carrying tools get mixed up over time.

Method used

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  • Station and method for measuring particulate contamination of a transport chamber for conveying and atmospherically storing semiconductor substrates
  • Station and method for measuring particulate contamination of a transport chamber for conveying and atmospherically storing semiconductor substrates
  • Station and method for measuring particulate contamination of a transport chamber for conveying and atmospherically storing semiconductor substrates

Examples

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Embodiment Construction

[0056] figure 1 Station 1 for measuring particle contamination is shown coupled to a FOUP transport carrier for transporting and storing semiconductor substrates at atmospheric pressure.

[0057] Although the figure shows a measurement station that can be coupled to a FOUP transport vehicle, the measurement station can be applied to other transport vehicles that transport and store semiconductor substrates under atmospheric pressure, such as, inter alia, standardized vehicles such as SMIF, FOSB, RSP or MRP.

[0058] These shipping vehicles have a confined air or nitrogen interior atmosphere at atmospheric pressure (ie, at a pressure substantially equal to the operating environment of the clean room, but isolated from the clean room).

[0059] as available from figure 2 and 3a As seen in , the transport carrier comprises a peripheral rigid shell 2 having a generally substantially parallelepiped shape and comprising an aperture which can be closed with a movable door 3 and size

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PUM

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Abstract

The invention relates to a station for measuring particulate contamination of a transport chamber for conveying and atmospherically storing semiconductor substrates, said transport chamber including a rigid enclosure (2) provided with an opening and a removable door (3) that enables the opening to be closed. The measuring station comprises: a chamber (4) having a controlled environment, comprising at least one loading port (8) suitable for being coupled to the rigid enclosure (2) and also to the door (3) of the transport chamber such as to move the door (3) into the chamber (4) having a controlled environment and place the inside of the rigid enclosure (2) in communication with the inside of the chamber (4) having a controlled environment ; and a measurement module (5) comprising a unit (14) for measuring the particles, and an enclosure measurement interface (16) configured such as to be coupled to the rigid enclosure (2) transport chamber coupled to the chamber (4) having a controlled environment, instead of to the door (3). Said measurement station is characterized in that said enclosure measurement interface (16) comprises a measurement head projecting from a base of an enclosure measurement interface, having a first sampling opening (12) connected to the unit (14), for measuring the particles, and at least two injection nozzles (20) configured to direct a gas stream onto at least two separate places of the rigid enclosure (2) coupled to the chamber (4) having a controlled environment. The respective orientations of the injection nozzles (20) are stationary relative to the coupled rigid enclosure (2). The invention also relates to a method for measuring particulate contamination of a transport chamber for conveying and atmospherically storing semiconductor substrates.

Description

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Claims

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Application Information

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Owner PFEIFFER VACUUM GMBH
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