Preparation method of SnSe nanosheet

[0033] Example 1 of the present application provides the first preparation method of tin selenide nanosheets, the specific steps are as follows:

[0034] The tin selenide powder (its purity is 99.999%) of 0.197g is weighed and then poured into a crucible as an evaporation source, and a silicon wafer is placed at 2.5 cm above the evaporation source as a substrate. Vacuum up to 5×10 -5 At Pa, the evaporation source was evenly heated to 470° C., kept for 5 minutes for vacuum coating, and finally black deposits were obtained on the substrate to obtain tin selenide nanosheets.

[0035] Carry out X-ray diffraction detection to the tin selenide nanosheet that the application embodiment 1 makes, as figure 1 As shown, it can be seen that the tin selenide nanosheets are orthorhombic SnSe, and its diffraction peaks are consistent with the PDF#48-1224 standard card. In addition, there are diffraction peaks from Si, which come from the Si sheet of the substrate.

[0036] Scanning electron m

[0039] Example 2 of the present application provides a second method for preparing tin selenide nanosheets, the specific steps are as follows:

[0040]Weigh 0.197g of SnSe powder (99.999%) and pour it into a crucible as an evaporation source. Place an ITO conductive glass as a substrate at 2.4cm above the evaporation source. When the vacuum degree in the vacuum thermal evaporation coating machine reaches 2×10 -5 At Pa, the evaporation source was evenly heated to 460° C. and kept for 6 minutes, and finally tin selenide nanosheets with black deposits were obtained on the substrate.

[0041] The X-ray diffraction results, scanning electron microscope results and element distribution detection results of the tin selenide nanosheets in this example are similar to those of Example 1.

[0043] Example 3 of the present application provides a third preparation method of tin selenide nanosheets, the specific steps are as follows:

[0044] Weigh 0.197g of SnSe powder (99.999%) and pour it into a crucible as an evaporation source. Place a molybdenum foil as a substrate at 2.6cm above the evaporation source. When the vacuum degree in the vacuum thermal evaporation coating machine reaches 3.5×10 -5 At Pa, the evaporation source is evenly heated to 480° C. and kept for about 5 minutes, and finally tin selenide nanosheets with black deposits are obtained on the substrate.

[0045] The X-ray diffraction results, scanning electron microscope results and element distribution detection results of the tin selenide nanosheets in this example are similar to those of Example 1.