High-strength ultralow-density transparent silicon dioxide aerogel as well as preparation method and application thereof
An ultra-low density, silicon dioxide technology, applied in chemical instruments and methods, inorganic chemistry, silicon compounds, etc., can solve the problems of limited application range, low light transmittance, safety hazards, etc., to improve the intrinsic mechanical strength, The effect of maintaining ultra-low density and increasing mechanical properties
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Example Embodiment
[0031]In the first aspect, the present invention provides a method for preparing a high-strength ultra-low-density transparent silica aerogel. The method includes the following steps:
[0032](1) Mix the silicone ester, alcohol solvent, water, acid catalyst and structure enhancer monomers uniformly to obtain a mixed solution, and then subject the mixed solution to a pre-hydrolysis reaction to obtain a pre-hydrolyzed compound, and then use an alcohol solvent to The pre-hydrolyzed compound is diluted to obtain a silicon source precursor (also referred to as silicon source precursor solution); in the present invention, the pre-hydrolyzed compound is a semi-hydrolyzed and semi-condensed compound with higher reactivity, and the silicon source precursor The reaction activity of the silicon source is relatively high, and the silicon source precursor is a semi-hydrolyzed and semi-condensed silicon source precursor with relatively high reactivity; in the present invention, the alcohol solvent cont
Example Embodiment
[0058]Example 1
[0059]①Add 15.2g of methyl orthosilicate, 32g of methanol, 3.6g of water, 10μL of 0.1mol / L dilute hydrochloric acid and 2.7g of 10-alkenylundecyltrimethoxysilane (structural strengthening Mix it with magnetic stirring, heat up to 70℃, reflux reaction (pre-hydrolysis reaction) at this temperature for 36h, cool to room temperature after the reaction, add 640g methanol for dilution, and obtain a semi-hydrolysis with relatively high reaction activity Semi-condensed silicon source precursor solution, the raw materials of each component in the silicon source precursor solution are in molar ratio Methyl orthosilicate: 10-alkenyl undecyl trimethoxysilane: methanol: water: contained in dilute hydrochloric acid The HCl is 1:0.1:210:2:10-6, Where the amount of methanol includes methanol for reaction (32g) and methanol for dilution (640g).
[0060]②Add 5 mL of 1mol / L lysine aqueous solution to the aforementioned silicon source precursor solution, stir and mix with magnetic force, p
Example Embodiment
[0064]Example 2
[0065]Embodiment 2 is basically the same as embodiment 1, except that:
[0066]In step ①, add 15.2g of methyl orthosilicate, 32g of methanol, 1.8g of water, 10μL of 0.1mol / L dilute hydrochloric acid and 1.35g of 10-alkenylundecyltrimethoxy into a single-necked flask. Silane (structural enhancer monomer), stir and mix with magnetic force, heat up to 70℃, reflux reaction (pre-hydrolysis reaction) at this temperature for 36h, cool to room temperature after the reaction, add 640g methanol for dilution, and get relatively reactive reaction Highly semi-hydrolyzed and semi-condensed silicon source precursor solution. The raw materials of each component in the silicon source precursor solution are in molar ratio. Methyl orthosilicate: 10-alkenyl undecyl trimethoxysilane: methanol: water: The HCl contained in dilute hydrochloric acid is 1:0.05:210:1:10-6, Where the amount of methanol includes methanol for reaction (32g) and methanol for dilution (640g).
[0067]In step ②, add 1 mL of
PUM
Property | Measurement | Unit |
---|---|---|
Density | aaaaa | aaaaa |
Compressive strength | aaaaa | aaaaa |
Density | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap