Penetrating agent generator, chemical vapor deposition reaction device and vapor deposition method
A chemical vapor deposition and reaction device technology, used in chemical vapor deposition method, preparation of aluminized or aluminum and other elements co-infiltration coating, chemical vapor deposition reaction device, infiltration agent generator field, to achieve a wide range of working temperature, variety many effects
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[0020] The embodiments of the present invention will be further described in further detail below with reference to the accompanying drawings and examples. The following examples are intended to illustrate the invention, but cannot be used to limit the scope of the invention.
[0021] Such as Figures 2 to 5 As shown, the present invention provides a bumping generator for a chemical vapor deposition reaction device, comprising a bottom cover 20, a plurality of trays 21, a top cover 23, and a plate 24, from the bottom to top, and a plurality of trays 21, a top cover 23, and a blade 24. 20, the tray 21, the top cover 23, and the plate 24 are reserved by the edge 32 of the projection 32, wherein the bottom cover 20 is provided with an air intake port 17, and each tray 21 is close to the edge. 32 There is a venting hole 27 that implements the up and down, the vent hole 27 on the adjacent tray 21 is disposed relatively, to form a folding airway; the top cover 23 is provided with an air out
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