OLED display substrate and manufacture method thereof

[0041]For better explaining the technical solution and the effect of the present invention, the present invention will be further described in detail with the accompanying drawings and the specific embodiments.

[0042]Please refer to FIG. 2. The present invention first provides an OLED display substrate, comprising:

[0043]a substrate 10, and the substrate 10 is a transparent substrate, and preferably, the substrate 10 is a glass substrate;

[0044]a TFT 90 located on the substrate 10; specifically, the TFT 90 comprises: a buffer layer 20 located on the substrate 10, a channel area 912 and a semiconductor layer 91 located in a source area 912 and a drain area 914 respectively at two sides of the channel area 912 on the buffer layer 20, a gate isolation layer 30 located on the semiconductor layer 91, a gate 94 located above the channel area 912 and on the gate isolation layer 30, an interlayer insulation layer 40 on the gate 94, a source 95 located in the source area 914 and penetrating the ga