Method for reducing welding hollows of LTCC substrate and metal base plate and LTCC substrate structure

A metal base plate and substrate technology, applied in the direction of electrical connection of printed components, printed circuit components, etc., can solve the problems of blocking organic substances and gas escape channels, reducing welding area and grounding area, affecting welding strength and grounding performance, etc. To achieve the effect of reducing the maximum void area, reducing the formation of voids, and reducing the void area

Active Publication Date: 2014-10-08
NO 43 INST OF CHINA ELECTRONICS TECH GRP CETC
View PDF6 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the spacing between the bulk metallization areas is too large, although it is conducive to the escape of flux and gas during welding, the too wide spacing reduces the welding area and grounding area, which affects the welding strength and grounding performance
If the spacing between the block metallized areas is too small, there will be alignment problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for reducing welding hollows of LTCC substrate and metal base plate and LTCC substrate structure
  • Method for reducing welding hollows of LTCC substrate and metal base plate and LTCC substrate structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] (1) Take 70wt% zinc borophosphate glass powder (composed of ZnO: 40wt%, B 2 o 3 : 10wt%, P 2 o 5 : 50wt%, softening point 410-440°C), add 30wt% mixture of ethyl cellulose and terpineol (in the mixture, ethyl cellulose accounts for 8wt%, terpineol accounts for 92wt%), through mixing and grinding Adjusted into the form of paste, the solder resist paste that can be used for printing is obtained. The solder resist paste is printed on the thick-film metallization layer on the surface of the LTCC substrate through a screen with grid lines prepared. The line width of the grid lines is 0.2 mm, and the line spacing is 3 mm. After the grid lines are heated at 130-150°C for 8-10 minutes and dried, they are put into a sintering furnace for sintering at a sintering temperature of 550°C. After sintering, the solder resist grid lines are firmly attached to the substrate metallization layer.

[0031] (2) Print the required low-temperature solder paste Sn62Pb36Ag2 on the surface of t

Embodiment 2

[0034] (1) Get 65wt% zinc borophosphate glass powder described in Example 1 and 8wt% inorganic additive Al 2 o 3 , grind it evenly, then add 27wt% of the mixture of ethyl cellulose and terpineol (in the mixture, ethyl cellulose accounts for 5wt%, terpineol accounts for 95wt%), and adjust it into a slurry form by mixing and grinding , which can be used for printing solder resist paste. The solder resist paste is screen-printed onto the thick film metallization layer on the surface of the LTCC substrate by making grid lines with a line width of 0.25mm and a line spacing of 2.5mm. After the grid lines are dried at 130-150°C for 8-10 minutes, they are put into a sintering furnace for sintering at a sintering temperature of 600°C. After sintering, the solder resist grid lines are firmly attached to the substrate metallization layer.

[0035] (2) Print the required medium-temperature solder paste Sn96.5Ag3.5 on the surface of the metallized layer of the substrate sintered with solde

Embodiment 3

[0038] Step (1) Get 65wt% zinc borophosphate glass powder described in example 1, add the mixture of 35wt% polyvinyl alcohol and butyl carbitol acetate (in the mixture, polyvinyl alcohol accounts for 4wt%, butyl carbitol acetate Alcohol acetate accounts for 96wt%), and other processes are the same as in Example 1.

[0039] X-ray inspection found that the welding void rate between the substrate and the metal base plate is about 17%, the largest void is less than 3% of the welding area, and the welding area is evenly distributed.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Softening pointaaaaaaaaaa
Widthaaaaaaaaaa
Softening pointaaaaaaaaaa
Login to view more

Abstract

The invention discloses a method for reducing welding hollows of an LTCC substrate and a metal base plate. The method comprises the following steps: presetting criss-cross resistance welding grid lines on a metalization layer of the surface of the substrate, and then welding the LTCC substrate and the metal base plate by adopting welding paste. As the grid lines are printed on the metalization layer of the welding surface of the LTCC substrate, discharge of fluxes and gas can be increased during welding of the LTCC substrate and the metal base plate, the formation of the hollows is reduced, and the voidage is reduced. As the grid lines are printed on the metalization layer of the welding surface of the LTCC substrate, more fluxes and gas can be discharged during welding, the accumulation of fluxes and gas is prevented, the welding area is increased, and the area of the biggest hollow is reduced. The design of multi-layer substrates and high-density grounding through holes does not need to be changed, many times of printing alignment for thickening of the rectangular-block metalization layer is avoided, and the grid lines are directly printed on the large-area metalization layer of the substrate. The printing is simple, the grid lines are clear and reliable, and the discharge channel of the fluxes can be ensured.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Owner NO 43 INST OF CHINA ELECTRONICS TECH GRP CETC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products