Preparation method for silicon-based negative electrode material with secondary cluster structure and used for lithium ion battery
A technology for silicon-based negative electrode materials and lithium-ion batteries, which can be used in battery electrodes, secondary batteries, structural parts, etc., can solve the problems of high energy consumption, weak binding force, and high production costs in high-temperature processing, and achieve good rate performance and improved The effect of combining force and reducing production cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0031] Example 1
[0032] (1) Disperse 0.2 g of silicon particles with a particle size of 30-50 nanometers in a mixed solution containing 50 mL of water and 200 mL of ethanol, and then add 2.5 mL (0.0335 mol) of 25% ammonia water, drop by drop. 2.0mL ethyl silicate, stirred for 12h, centrifuged, and dried to obtain Si@SiO 2 particle.
[0033] (2) The Si@SiO prepared in (1) 2 Take 0.3g of the particles and disperse them in 18mL of ethylene glycol, add 0.5mL of water, add 0.126g (1mmol) of manganese chloride and 67μL (1mmol) of ethylenediamine, disperse uniformly by ultrasonic, put it in a hydrothermal kettle, React for 6 hours, centrifuge and dry to obtain Si@SiO 2 Clusters.
[0034] (3) Take the Si@SiO prepared in (2) 2 Cluster 0.2g, dispersed in 60mL water, uniformly dispersed by ultrasonic, add 0.2mL (0.00268mol) of 25% ammonia water, 0.0182g (0.05mmol) of cetyltrimethylammonium bromide, stir for 1h, add 0.048g of resorcinol, 0.067mL (0.86mmol) of a 36.5% aqueous formaldehyde soluti
Example Embodiment
[0038] Example 2
[0039] (1) Disperse 0.2 g of silicon particles with a particle size of 30-50 nanometers in a mixed solution containing 50 mL of water and 200 mL of ethanol, and then add 2.5 mL (0.0335 mol) of 25% ammonia water, drop by drop. 2.0mL ethyl silicate, stirred for 12h, centrifuged, and dried to obtain Si@SiO 2 particle.
[0040] (2) The Si@SiO prepared in (1) 2 Take 0.3g of the particles and disperse them in 18mL of ethylene glycol. Add 0.5mL of water, add 0.173g (1mmol) of manganese acetate and 67μL (1mmol) of ethylenediamine. Disperse uniformly by ultrasonic and put them in a hydrothermal kettle at 200℃. React for 6h, centrifuge and dry to obtain Si@SiO 2 Clusters.
[0041] (3) Take the Si@SiO prepared in (2) 2 Cluster 0.2g, dispersed in 60mL water, uniformly dispersed by ultrasonic, add 0.2mL (0.00268mol) of 25% ammonia water, 0.0182g (0.05mmol) of cetyltrimethylammonium bromide, stir for 1h, add Resorcinol 0.048g, mass fraction 36.5% formaldehyde aqueous solution 0.0
Example Embodiment
[0042] Example 3
[0043] (1) Disperse 0.2 g of silicon particles with a particle size of 30-50 nanometers in a mixed solution containing 50 mL of water and 200 mL of ethanol, and then add 2.5 mL (0.0335 mol) of 25% ammonia water, drop by drop. 2.0mL ethyl silicate, stirred for 12h, centrifuged, and dried to obtain Si@SiO 2 particle.
[0044] (2) The Si@SiO prepared in (1) 2 Take 0.3g of the particles and disperse them in 18mL of ethylene glycol. Add 0.5mL of water, add 0.13g (1mmol) of cobalt chloride and 67μL (1mmol) of ethylenediamine. Disperse uniformly by ultrasonic, and put it in a hydrothermal kettle at 200℃. React for 6 hours, centrifuge and dry to obtain Si@SiO 2 Clusters.
[0045] (3) Take the Si@SiO prepared in (2) 2 Cluster 0.2g, dispersed in 60mL water, uniformly dispersed by ultrasonic, add 0.2mL (0.00268mol) of 25% ammonia water, 0.0182g (0.05mmol) of cetyltrimethylammonium bromide, stir for 1h, add Resorcinol 0.048g, mass fraction 36.5% formaldehyde aqueous solution 0.
PUM
Property | Measurement | Unit |
---|---|---|
Particle size | aaaaa | aaaaa |
Volume usage | aaaaa | aaaaa |
Particle size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap