The invention discloses a photoetching method for preparing a hydrophilic-hydrophobic pattern. The photoetching method comprises the following steps of firstly, coating or spraying a pattern connection layer with a pattern on a substrate; secondly, coating, spraying or spinning a surface coating layer; and finally, performing irradiation by ultraviolet light or sunlight or visible light or infrared light to obtain the hydrophilic-hydrophobic pattern, wherein the material of the substrate is selected from arbitrary one of glass, metal, alloy, stainless steel, a wall body, paper and cotton fabric, the pattern connection layer is organic silicon gel or siloxane with the pattern, the surface coating layer is micronano TiO2 particles with sizes being 10 nanometers to 10 micrometers or micronano TiO2 particles of which surfaces are modified with a low-surface energy substance. A photomask is not needed, the preparation method is simple, the application range of a photoetching technology is expanded, energy sources are saved, the pattern with an arbitrary pattern can be prepared, self supply of the low-surface energy substance is achieved, so that the service lifetime of the low-surface energy substance is prolonged, and the photoetching has a wide application prospect.