Mask, preparation method of mask and photoetching method
一种掩膜版、掩膜图案的技术,应用在光掩膜领域,能够解决显示基板制作周期长、没有充分利用石英基板空间、显示基板制作成本高等问题
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[0035] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0036] see figure 1 The mask plate 1 provided by the embodiment of the present invention includes a light-transmitting substrate 10, and the light-transmitting substrate 10 includes opposite first surfaces and second surfaces; the light-transmitting substrate 10 is generally a quartz substrate (quartz glass), or other material substrates, A detailed description will not be given here.
[0037] In the embodiment of the present invention, both the first surface and ...
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