Surface enhanced Raman scattering substrate, detection chip and preparation method

[0035] Example 1

[0036] This embodiment provides a surface enhanced Raman scattering substrate, the preparation process is figure 1 As shown, a magnetron sputtering technology is used to sputter a gold film on the detection zone of the glass sheet to form a gold film that is stabilized, and then the single molecular weight gold nano-mouse is added over the gold film. Specific steps are as follows:

[0037] Step 1: Use acetone, water-absolute ethanol, deionized water to clean the glass and blow dry, block the non-detection area;

[0038] Step 2: Sputtering a gold film is sputtered on the detection zone corresponding to the glass sheet by magnetron sputtering technique to form a gold film for stable uniform;

[0039]Step 3: The concentration of 1 mm Biotin-PEG-SH was configured, then 10 μml was added dropwise on the gold film, and the excess Biotin-PEG-SH washed after 30 min.

[0040] Step 4: Take 90 μml of gold nanocol and 10 μml of Avidin-SH mixed incubation for 30 min, then centri

[0043] Example 2

[0044] This embodiment provides a surface enhanced Raman scatter detection chip, such as image 3 As shown, the surface enhanced Raman scattering base layer provided by the PDMS microfluid panel and Example 1, which is divided into three-layer structure, and the PDMS microfluid panel is sequentially the first microfluidic layer. Di-flow control layer and matrix, the substrate here is glass.

[0045] First layer (first microfluidic layer): The first microfluidic channel is provided with a first microfluidic channel, and the first microfluidic channel is provided with an inlet and two outlets, which is a y-shaped structure; The inlet of a microfluidic channel is used to inject blood samples to be detected.

[0046] Layer 2 (second microfluidic layer): The second microfluidic channel is provided on the second microfluidic passage. The second microfluidic channel is two separate channels, both channels are linear, and mutual Parallel; each independent channel is in the

[0051] Example 3

[0052] This embodiment provides a method of preparing a surface enhanced Raman scattering detection chip, and the specific steps are as follows:

[0053] Step 1: Draw.

[0054] The structure of the PDMS microfluidic channel in Example 2 was drawn with CAD, and the mask plate was prepared.

[0055] Step 2: Preparation of the SU-8 photoresist mold.

[0056] The lithography process flow is as follows:

[0057] Step 21. Preggit the silicon wafer. The silicon wafer was sequentially washed in acetone, anhydrous ethanol, deionized water.

[0058] Step 22. Add an appropriate amount of SU-8 photoresist on the silicon wafer to stand for 10 min.

[0059] Step 23. Substate. The silicon wafers with SU-8 glue are placed on the glue machine, first 500RAD / min to turn 10s, and then 1000rad / min turn 30s.

[0060] Step 24. Getting. The silicon wafer after the glue was placed on the hot stage, 15 min at 65 ° C, and tediment at 95 ° C for 45 min.

[0061] Step 25. The exposure