Light-emitting device based on nitride transistor and integrated Micro LED micro display device

A technology for micro-display devices and light-emitting devices, which is applied in the direction of electric solid devices, semiconductor devices, electrical components, etc., to achieve the effects of good bonding performance, improved driving efficiency, and large layout area.

Pending Publication Date: 2021-12-10
XIAMEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, there are many references to the method of realizing multi-color controllable through the integration of transistors

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0039] Example 1

[0040] The nitride-based transistor-based integrated microLED micro display includes the above-described nitride transistor-based light-emitting device, and the light emitting device is arranged in a plurality of pixel units, and the drive transistors are driven in the pixel unit. The spacing ranges from 8 to 100 microns. like figure 2 and image 3 As shown, the surface of the pixel unit covers having a package layer 18, in a preferred embodiment, the package layer 18 can be a transparent encapsulating layer. The substrate 1 below the LED chip is provided with an opening through the second surface of the substrate 1, and a transparent matrix 20 is provided in the open hole, and the side wall of the opening is provided with a second reflective layer 19, which is disposed on the transparent matrix 20. There is a prism 23. The prism 23 can function as a concentrating effect, increasing the light, and binds to the first reflective layer 18 and the second reflective laye

Example Embodiment

[0043] Example 2

[0044] Example 2 The difference from Embodiment 1 is that the blue light-emitting device, the green light-emitting device, and the red light light emitting device are different, and the LED chip is all in the production process of the blue light-emitting device, the green light-emitting device, and the red light emission device. The green LED chip is used. like Figure 4 and 5 As shown, the green light-emitting device 101 can be used as a green LED chip and combined with the transparent matrix 20, it can become a green light light-emitting device 101 that emits green light.

[0045] The LED chip corresponding to the blue light-emitting device 201 and the red light-emitting device 301 is a blue-racer nanocrocolite LED chip formed in the green LED chip. Specifically, the green LED chip epitaxial layer is etched to obtain a nanocrochemical structure, and the green LED epitaxial layer is etched out of the longitudinal direction of the wall thickness, only the thin wall

Example Embodiment

[0046] Example 3

[0047] Example 3 The difference from Embodiment 1 is that the interval between the drive transistors and the LED chips ranges from nanoscale, such as Image 6 and 7 As shown, the LED chip is used in the production process of the blue light-emitting device 102, the green light-emitting device 202, and the red light-emitting device 302, the LED chip is a LED epitaxial layer having a nanometer scale of the selective molecular beam epitaxial growth. Specifically, the blue light-emitting device 102 includes a blue nanowire LED chip, a green light-emitting device 202 comprising a green nanowire LED chip, and the red light-emitting device 302 includes a red nanowire LED chip. Blu-ray, green light, and red light can be obtained by the size of the control interval. In a preferred embodiment, the blue-ray nanowire LED chip has a diameter of 630 to 640 nm, and the green nanowire LED chip has a diameter of 420 to 440 nm, and the red nanowire LED chip has a diameter of 220 to 24

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Abstract

The invention discloses a light-emitting device based on a nitride transistor and an integrated Micro LED micro display device. A driving transistor and an LED chip are integrated on a first surface of a substrate, firstly, an epitaxial layer of the driving transistor is grown on the first surface of the substrate, and then the epitaxial layer of the driving transistor is etched at intervals to expose the first surface of the substrate, so that the first surface of the substrate is exposed, the epitaxial structure of the LED chip is grown on the exposed first surface of the substrate through secondary epitaxial growth, so that the driving transistor and the LED chip are integrated on the same surface of the substrate at the same time, the driving efficiency can be improved, and the layout arrangement area is large. The LED chip adopts a secondary epitaxial growth mode, so that the performance and the process are better, the light of the LED chip can be emitted from the second surface of the substrate, the light is not absorbed by other layers in the middle, and the light loss is small.

Description

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Claims

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Application Information

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Owner XIAMEN UNIV
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