Electrostatic chuck with magnetic cathode liner for critical dimension (CD) tuning

[0025]Electrostatic chucks with magnetic cathode liners for critical dimension (CD) tuning are described. In the following description, numerous specific details are set forth, such as specific chuck and / or chamber configurations, in order to provide a thorough understanding of embodiments of the present invention. It will be apparent to one skilled in the art that embodiments of the present invention may be practiced without these specific details. In other instances, well-known aspects, such as etch processing in the presence of a wafer supported by a chuck, are not described in detail in order to not unnecessarily obscure embodiments of the present invention. Furthermore, it is to be understood that the various embodiments shown in the Figures are illustrative representations and are not necessarily drawn to scale.

[0026]One or more embodiments described herein are directed to a magnetic cathode liner for critical dimension (CD) tuning during plasma processing. For example, to offe