The invention discloses a method for
exposure compensation and correction, including: S10, editing a test file, and setting partitions; S11, performing
exposure without any compensation and correction to a graphic file; S12, detecting a product according to partitions, and recording the sizes of the IC opening in each partition in the X and Y directions as X'1, Y'1; X'2, Y'2; ... X'm, Y'm; S13, calculating a scale; S14, analyzing data of X and Y directions, respectively fitting into corresponding relation formulas, and generating different types of IC opening compensation data X[compensation] and Y[compensation]; and S15: after determining the compensation data, applying on files and manufacturing products to verify reproducibility. The method for
exposure compensation and correction of the present invention performs compensation on files, mainly plays the role of opening correction, and is more convenient, more economical, and more effective and feasible than general methods by using a compensation
photomask or an exposure apparatus.