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11 results about "Exposure" patented technology

In photography, exposure is the amount of light per unit area (the image plane illuminance times the exposure time) reaching a photographic film or electronic image sensor, as determined by shutter speed, lens aperture and scene luminance. Exposure is measured in lux seconds, and can be computed from exposure value (EV) and scene luminance in a specified region.

Method of adjusting digital camera image processing parameters

A method for adjusting predetermined ISO-dependent image processing parameters for images captured by a digital camera includes measuring the exposure deviation in exposure units from an optimal exposure as determined by the camera during an image capture process, deriving an estimated camera sensitivity from the exposure deviation, and adjusting the ISO-dependent image processing parameters for images captured by the camera as a function of the derived estimated camera sensitivity.
Owner:FOVEON

Image processing devices with efficient motion blur detection and methods of operating same

ActiveUS20210150735A1Increase speedRobust and computationally inexpensiveImage enhancementImage analysisPattern recognitionImaging processing
Image processing devices utilize computationally efficient operations based on exposure time and object speed to detect and estimate motion blur. These operations include determining, from a plurality of image frames of an object, a representative length of movement associated with at least one feature point of the object, which undergoes movement between the plurality of image frames. This representative length of movement is converted to an estimate of motion blur for a respective image frame, using operations that are function of length of movement and exposure time.
Owner:SONY CORP

Double-arm collaborative robot control method and system for assisting oral medical image

PendingCN113647972ARadiation diagnostic device controlSurgical navigation systemsKinematic controllerLight sensing
The invention discloses a double-arm collaborative robot control method and system for assisting oral medical images. The system comprises a collaborative robot, a motion controller of the collaborative robot, an image bulb tube clamping mechanism, a photosensitive plate tail end clamping mechanism, an oral cavity posture detection module, an oral cavity posture detection sensor, a human-computer interaction interface and a server. A collaborative robot clamped by a tail end light sensing plate is used for tracking an intraoral tooth position of a patient, so that the tail end clamping is made to be close to a focus area as much as possible, and precise positioning and self-adaptive dynamic tracking are carried out; and based on the control method of multi-modal information, the collaborative robot is used for being close to a shooting part to assist image operation, and the image bulb tube is controlled to perform shooting operation by comparing and matching the signals reflecting the image parameters. The system can realize automatic tracking of the focus tooth position, solves the problems of poor consistency and exposure stability in the oral cavity imaging process, and effectively reduces virus cross infection caused by contact between doctors and patients.
Owner:BEIJING UNIV OF TECH

Exposure batch control method and system

The invention discloses an exposure batch control method and system. The method comprises the following steps: obtaining exposure energy of a product batch which is currently operated in exposure equipment; obtaining exposure energy and alignment precision of subsequent product batches; when the exposure energy of the currently operated product batch is greater than the reference energy and the exposure energy of the subsequent product batches is less than the reference energy, arranging the subsequent product batches with the characteristic value of alignment precision greater than or equal to the reference value into a first queue, and arranging the subsequent product batches with the characteristic value of alignment precision less than the reference value into a second queue; the higher the characteristic value of the alignment precision is, the lower the requirement on the alignment precision is; and performing operation on the operation sequence of the subsequent product batches according to the sequence of firstly operating the first queue and then operating the second queue. According to the invention, when the exposure energy of the currently operated product batch is determined to be relatively high, the product batch with low requirement on the alignment precision in the subsequent product batches is operated preferentially, so that the aberration problem is avoided, and the yield of a production line is improved.
Owner:HUA HONG SEMICON WUXI LTD

Phase shift mask and detection method for light transmission uniformity of slit of photoetching machine

PendingCN114690537APrevent yield lossSolve the problem that only offline measurement strategy can be adoptedPhotomechanical exposure apparatusOriginals for photomechanical treatmentSilicon chipExposure
The embodiment of the invention discloses a phase shift mask and a detection method for light transmission uniformity of a slit of a photoetching machine. The detection method comprises the following steps: respectively exposing on a first test silicon wafer at different focal plane positions according to a preset exposure dose by using a first phase shift mask; detecting a phase shift error of each marked pattern at different focal plane positions, fitting a relation curve between the phase shift error and the focal plane position, and obtaining a slope '; calculating a longitudinal intercept b'of a slope corresponding to each marked pattern and an exposure dose fitting straight line; and finally, determining the uniformity of slit illumination according to the dispersion of the longitudinal intercept b'of each marked pattern. The embodiment of the invention can solve the problem that the existing illumination uniformity measurement can only adopt off-line measurement, not only can adapt to complex and changeable actual working conditions, but also can quickly judge whether the vertical illumination system needs to be recalibrated or not, simplify the measurement process, and ensure that a machine does not stop and continuous production is realized.
Owner:SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD

Method for exposure compensation and correction

InactiveCN103207526AQuality improvementImprove finenessPhotomechanical exposure apparatusMicrolithography exposure apparatusExposureExposure compensation
The invention discloses a method for exposure compensation and correction, including: S10, editing a test file, and setting partitions; S11, performing exposure without any compensation and correction to a graphic file; S12, detecting a product according to partitions, and recording the sizes of the IC opening in each partition in the X and Y directions as X'1, Y'1; X'2, Y'2; ... X'm, Y'm; S13, calculating a scale; S14, analyzing data of X and Y directions, respectively fitting into corresponding relation formulas, and generating different types of IC opening compensation data X[compensation] and Y[compensation]; and S15: after determining the compensation data, applying on files and manufacturing products to verify reproducibility. The method for exposure compensation and correction of the present invention performs compensation on files, mainly plays the role of opening correction, and is more convenient, more economical, and more effective and feasible than general methods by using a compensation photomask or an exposure apparatus.
Owner:KUN SHAN POWER STENCIL
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