Provided is an apparatus for producing
semiconductor and other devices, which can improve the quality of deposited films and increase the yield of produced devices in comparison with the conventional apparatus. The apparatus of the invention comprises a plurality of dry treatment chambers (7a, 7b, 7c, 7d, 7e), a transfer room (6) interconnecting the dry treatment chambers (7a, 7b, 7c, 7d, 7e), loading / unloading chambers (8a, 8b, 8c, 8d), and a cleaning apparatus (13). The transfer room (6) and the cleaning apparatus (13) are directly or indirectly connected to each other.