Method for eliminating resin film and method for producing laminate

A manufacturing method, resin film technology, applied in the direction of chemical instruments and methods, lamination, layered products, etc., can solve the problems of unoptimized, optical defects, etc., and achieve the effect of efficient removal

Inactive Publication Date: 2012-11-21
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in this method, for example, when the thickness of one substrate is reduced from 0.7 mm to 0.2 mm or 0.1 mm, most of the material of the original substrate is removed with an etching solution. not preferred
[0004] In addition, in the ab

Method used

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  • Method for eliminating resin film and method for producing laminate
  • Method for eliminating resin film and method for producing laminate
  • Method for eliminating resin film and method for producing laminate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0112] (Production of reinforcing plate)

[0113] The glass plate of the reinforcing plate uses a glass plate (manufactured by Asahi Glass Co., Ltd., AN100, alkali-free glass) of length 720 mm × width 600 mm × thickness 0.4 mm obtained by the float method. The average linear expansion coefficient of the glass plate is 38×10 -7 / ℃.

[0114] The glass plate was cleaned with pure water and UV cleaned to clean the surface of the glass plate. Then, 100 parts by mass of solvent-free addition reaction type silicone (manufactured by Shinetsu Silicone Co., Ltd., KNS-320A) and 5 parts by mass of platinum-based catalyst (Shinetsu Silicone Co.) were coated on the surface of the glass plate with a spin coater. ,Ltd., CAT-PL-56) mixture (coating amount 20g / m 2 ).

[0115] The solvent-free addition reaction type silicone includes a linear organoalkenyl polysiloxane (main agent) having a vinyl group and a methyl group bonded to a silicon atom, and a hydrogen atom and a methyl group bonded to the

Embodiment 2

[0130] In Example 2, a linear polyorganosiloxane having vinyl groups at both ends (manufactured by Arakawa Chemical Industry Co., Ltd., 8500) and a methylhydrogenpolysiloxane having a hydrosilyl group in the molecule ( The mixture of Arakawa Chemical Industry Co., Ltd. 12031) and a platinum-based catalyst (Arakawa Chemical Industry Co., Ltd., CAT12070) was used as a curable resin composition for forming the resin layer. Reinforcing was prepared in the same manner as in Example 1, except that board.

[0131] Here, the mixing ratio of the linear polyorganosiloxane and the methylhydrogenpolysiloxane is adjusted so that the molar ratio of the vinyl group and the hydrosilyl group is 1:1. In addition, the amount of the platinum-based catalyst was 5 parts by mass relative to 100 parts by mass in total of the linear polyorganosiloxane and methylhydrogenpolysiloxane.

[0132] Then, in the same manner as in Example 1, the figure 2 After heat-processing the laminated body shown, the peeling op

Embodiment 3

[0137] In Example 3, the same as in Example 2 was produced as figure 2 After heat-processing the laminated body shown, the peeling operation of the glass substrate and the reinforcing plate is performed.

[0138] After the peeling operation, by heating the reinforcing plate in the atmosphere at 370°C for 5 minutes, the surface of the resin layer (resin film) opposite to the glass plate was exposed to the atmosphere at 370°C for 5 minutes. After that, the reinforcing plate was cooled from 370°C to 50°C at an average cooling rate of 15°C / sec, and then cooled to room temperature. Next, brush cleaning with isoparaffin solution (manufactured by Idemitsu Kosan Co., Ltd., IP SOLVENT 2028, solubility parameter of 7, flash point of 86°C) for 1 minute, and after washing off the resin layer (resin film), heating by blowing Air to 200°C to remove the solvent.

[0139] The isoparaffin solution described above contains 80.5% by mass of isohexadecane, 3.0% by mass of isotridecane, and 16.5% by m

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Abstract

The invention provides a method for eliminating resin film, i.e., a method for eliminating a resin film adhered to a glass plate, said method comprising a heat treatment step for heat treating a resin film adhered upon a glass plate and a washing step for washing away the heat-treated resin film. During the heat treatment step, the surface on the reverse side of the glass plate from the resin film is exposed to the atmosphere at a temperature of 300-450 DEG C, an inert atmosphere at a temperature of 350-600 DEG C or to water vapor at a temperature of 150-350 DEG C.

Description

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Claims

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Application Information

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Owner ASAHI GLASS CO LTD
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