The invention relates to an Au-Sn
alloy sputtering target material and a preparation method thereof. The method comprises the following steps: 1, Au and Sn are taken as raw materials,
vacuum induction melting and
vacuum casting are used for
casting so as to obtain an eutectic or hypo eutectic Au-Sn
alloy ingot, wherein the content of Ge in the
alloy ingot accounts for 2 to 12.5 wt percent, and the content of Au serves as the balance; 2, a
heating furnace is used for carrying out homogenization heat treatment on the alloy
ingot obtained in the step 1; the temperature of the homogenization heat treatment is 270 to 340 DEG C, and the time is 50 to 65 minutes; 3, plastic working equipment is used for carrying out hot plastic
processing to the ingot in the thickness direction; 4, the blank is placed inside the
heating furnace for temper heat treatment after each 1 to 2 times of
processing, the temperature is 270 to 340 DEG C, and the time is 10 to 30 minutes; and 5, the step 3 and the step 4 are repeated until the required target blank dimension is obtained. The Au-Sn alloy
sputtering target material obtained through the method is even in components, and has a microscopic structure mainly composed of an Au
solid solution and bulks of Ge distributed in a diffused manner.