Heat treatment method of quartz glass

一种热处理方法、石英玻璃的技术,应用在玻璃的成型、玻璃生产、玻璃制造设备等方向,能够解决杂质污染风险增大、生产效率低、热处理保温时间长等问题,达到缩短保温时间、提高生产效率、低应力双折射的效果

Pending Publication Date: 2020-01-07
ZHONGTIAN TECH
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the existing technology has the problem of long heat preservation time, which leads to an increased risk of impurity contamination and low production efficiency

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Put the silica powder in a sintering furnace at 1600°C for vitrification treatment. After the powder is completely vitrified, cool down to 1300°C at a rate of -300°C / h, and then cool down at a rate of -50°C / h To the heat treatment temperature of 1200°C, keep it for 2 hours, then lower the temperature to the first annealing point temperature of 950°C at the first annealing rate of -15°C / h, and finally lower the temperature to room temperature at the second annealing rate of -100°C / h, the obtained transparent quartz glass The stress birefringence reaches 1.7nm / cm, and the data results are shown in Table 1.

Embodiment 2

[0037] Place the silica powder in a sintering furnace at 1600°C for vitrification treatment. After the powder is completely vitrified, cool down to 1300°C at a rate of -300°C / h, and then cool down at a rate of -100°C / h To the heat treatment temperature of 1150°C, keep it for 3 hours, then lower the temperature to the first annealing point temperature of 930°C at the first annealing rate -3°C / h, and finally lower the temperature to room temperature at the second annealing rate -100°C / h, the obtained transparent quartz glass The stress birefringence reaches 0.5nm / cm, and the data results are shown in Table 1.

Embodiment 3

[0039] Place the silica powder in a sintering furnace at 1600°C for vitrification treatment. After the powder is completely vitrified, cool down to 1300°C at a rate of -400°C / h, and then cool down at a rate of -150°C / h To the heat treatment temperature of 1100°C, keep it warm for 5 hours, then lower the temperature to the first annealing point temperature of 900°C at the first annealing rate -8°C / h, and finally lower the temperature to room temperature at the second annealing rate -150°C / h, the obtained transparent quartz glass The stress birefringence reaches 1.3nm / cm, and the data results are shown in Table 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
glass transition temperatureaaaaaaaaaa
Login to view more

Abstract

The invention provides a heat treatment method of quartz glass. The heat treatment method adopts a vitrification molding and heat treatment integrated process, and comprises: (1) vitrifying a silicondioxide raw material to obtain a transparent quartz glass; (2) directly cooling the vitrified high-temperature transparent quartz glass to a heat treatment temperature, and carrying out thermal insulation; and (3) cooling the obtained quartz glass to a room temperature at a certain annealing rate to obtain the transparent quartz glass with low stress birefringence. According to the method of the invention, vitrification forming and heat treatment are carried out in the same sintering furnace, the temperature after vitrification forming is directly reduced to the heat treatment temperature, andthermal insulation is carried out, so that the heat treatment thermal insulation time is effectively shortened, the pollution risk is reduced, the production efficiency is improved, and the stress birefringence of the prepared quartz glass is smaller than 1.8 nm / cm.

Description

technical field [0001] The invention relates to a heat treatment method for quartz glass, in particular to a heat treatment method for quartz glass which shortens the heat treatment holding time. Background technique [0002] Quartz glass is fused from pure silica. Many of its physical and chemical properties are the "best" of glass. It is widely used in high-tech industries such as microelectronics, optoelectronics, precision optics, aerospace, and nuclear technology. [0003] In the past 30 years, the semiconductor market has grown at a high speed, which has had a huge impact on the modern economy and national defense, among which the support of lithography technology plays a very critical role. At present, the light sources of international mainstream lithography technology are KrF excimer laser (248nm) and ArF excimer laser (193nm), and with the further miniaturization of semiconductor devices, the choice of light source wavelength will become shorter and shorter. This ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C03B20/00C03B25/00
CPCC03B20/00C03B25/00Y02P40/57
Inventor 范艳层钱宜刚沈一春陈峰许维维丁杰
Owner ZHONGTIAN TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products