Three-dimensional memory and forming method thereof
一种存储器、三维的技术,应用在电固体器件、半导体器件、电气元件等方向,能够解决三维存储器制造工艺繁琐、制造成本高等问题
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[0047] The specific implementation of the three-dimensional memory provided by the present invention and its forming method will be described in detail below in conjunction with the accompanying drawings.
[0048] In the process of forming a three-dimensional memory with double-layer channel holes, the current process is generally to first form the underlying stack structure and the connecting layer covering the surface of the underlying stacking structure, and then etch the underlying stacking structure and the connecting layer , forming a lower channel hole; then, depositing a first filling layer on the sidewall of the lower channel hole and the surface of the connection layer; then, removing the sidewall covering the connection layer and the surface of the connection layer by an etching process The first filling layer on the top sidewall of the lower channel hole exposes the connection layer at the sidewall of the lower channel hole; after that, a part of the top part of the...
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