The invention discloses an on-line
atomic layer deposition device, which comprises a substrate feeding
system, a
processing chamber, a precursor feeding
system, at least one loading and unloading element, a lifting element, a control and detection
system and an exhaust system, wherein a substrate is fed into the
processing chamber by the substrate feeding system; the precursor feeding system is arranged on the side face of the
processing chamber; the loading and unloading element is arranged at the inlet and outlet position of the processing chamber; the lifting element is arranged just below the processing chamber and is in contact with a substrate carrying device through an open groove on the processing chamber; and the control and detection system and the exhaust system are connected with the processing chamber respectively. According to the on-line
atomic layer deposition device, the problem of the complex loading element and substrate carrying device can be solved, and
atomic layer deposition on the surface of a substrate can be realized in a
batch processing mode.