On-line atomic layer deposition device and deposition method
一种原子层沉积、承载装置的技术,应用在涂层、金属材料涂层工艺、气态化学镀覆等方向,能够解决装载元件和基板承载装置复杂等问题,达到缩短冲洗时间、减少配置、易于实现的效果
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Embodiment 1
[0052] see Figure 1~5 As shown, the invention is applied in the photovoltaic field, and the size is 156×156mm under low voltage 2 A passivation film of aluminum oxide with a thickness of 15 nm was deposited on the solar panel substrate. The device includes a preheating chamber 4, five sequentially arranged ALD reaction chambers 5, a cooling chamber 6, a substrate feeding system 1, a precursor feeding system 13, a heating system, loading and unloading elements 7, and lifting elements 19 , control and detection system 12, vacuum pump 9, vacuum pipeline 11, electrical cabinet 8 and tail gas treatment system. exist figure 1 In , five reaction chambers are arranged sequentially between a preheating chamber and a cooling chamber. The reaction precursors are TMA and H 2 O or O 3 . Flushing gas is N 2 .
[0053] The substrate feeding system 1, loading and unloading components 7, heating system, exhaust gas treatment system and control and detection system 12 are shared by all...
Embodiment 2
[0056] An atomic layer deposition apparatus, which is different from Embodiment 1 in that it does not include a vacuum pump 9 and a vacuum pipeline 11, but is equipped with a fan to pump air into a closed reaction chamber formed by the substrate carrying system 2 and the upper covers 18 of each chamber . This device is used for the ALD method under normal pressure with a size of 156×156mm 2 A 15nm aluminum oxide passivation film was deposited on the solar panel substrate.
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