Manufacturing process of graphene transparent conductive film

The invention relates to a manufacturing process of a graphene transparent conductive film. The manufacturing method includes the steps of 1), uncoiling a copper foil in a vacuum chamber, heating a copper-clad chemical deposition reaction zone by using a resistor, feeding in methane gas and hydrogen, subjecting a copper-clad surface to chemical sedimentation to generate a graphene layer, and then adopting plasma to perform etching processing on the graphene layer; 2), adopting a gravure printing process to obtain an oxidize graphene layer; 3), obtaining an oxide graphene film; 4), coating a copper chloride etching solution which is 200g/L in concentration on a copper-clad face of the oxidize graphene film; 5), subjecting the oxidize graphene film to thermal annealing and reduction; 6), coating resin adhesive, sticking the film for packaging, and finally obtaining the patterned graphene transparent conductive film. The manufacturing process is short in film forming time, and low-cost and large-scale mass manufacturing can be realized; the graphene transparent conduction film is high in electric conductivity, good in flexibility, high in pattern definition, higher in acid and alkali resistance of the transparent conductive film and lower in cost.