Negative-working imageable elements with improved abrasion resistance

a technology of imageable elements and negative working, applied in the field of negative working imageable elements, can solve the problems of affecting the inhibition of free radical photopolymerization, and achieve the effect of influencing the viscosity of coating formulations and increasing the viscosity

Active Publication Date: 2009-09-17
EASTMAN KODAK CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The technical effect of this patented technology is that it allows for improved coatings with low levels of added materials without causing problems such as thickening or curling during storage. This results from the use of specialized silicon dioxide (SiO2) particles that have been modified with specific chemicals.

Problems solved by technology

The technical problem addressed in this patent is improving the abrasion resistance and reducing tackiness of negative- working imageable elements during manufacturing processes while maintaining their desired characteristics.

Method used

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  • Negative-working imageable elements with improved abrasion resistance
  • Negative-working imageable elements with improved abrasion resistance
  • Negative-working imageable elements with improved abrasion resistance

Examples

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examples

[0176]The components and materials used in the examples and analytical methods were as follows. Unless otherwise indicated, the components can be obtained from various commercial sources such as Aldrich Chemical Co. (Milwaukee, Wis.).

Aerosil ® 200Fumed hydrophilic silica particles having an average particle sizeof 12 nm available form EVONIK (Germany)Desmodur ® N100Trifunctional isocyanate (biuret of hexamethylene diisocyanate),that is available from Bayer (Germany)HEMA(2-Hydroxyethyl)methacrylateHEPi2-(2-Hydroxyethyl)piperidineHMDIHexamethylene diisocyanateJoncryl ® 683Acrylic resin obtained from SC Johnson & Son Inc. having anacid number of 162 mg KOH / gKayamer PM-2Ester of 1 mol phosphoric acid and 1.5 mol hydroxyethyl-methacrylate that is available from Nippon Kayaku (Japan)Nanopol ® C784Surface-modified silica particles (NanoResins GmbH, Germany),avg. particle size 20 nm, 29 weight % solution in n-butyl acetateNK Ester BPE-500Ethoxylated bisphenol A having methacrylic end groups,

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Abstract

Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica particles, that are present in an amount of from about 1 to about 40 weight %, have an average particle size of from about 1 to about 500 nm, have surface hydroxy groups, and have a carbon content of from about 0.5 to about 15 weight % that is derived from surface hydrophobic groups having 1 to 30 carbon atoms. The presence of the surface-modified silica particles provides improved abrasion resistance, reduced tackiness, and various other desired properties.

Description

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Claims

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Application Information

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Owner EASTMAN KODAK CO
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