Process flow control method and semi-conductor equipment

[0002] In semiconductor manufacturing, a set of process flow is often set in advance, which includes multiple process segments, that is, process steps, such as photolithography, etching (wet etching, dry etching), diffusion, ion implantation, etc. Etc., each process section represents the execution of the corresponding process for semiconductor devices. The process section includes mandatory process sections and optional process sections. The mandatory process section is an indispensable item in the execution of the entire process process, while the optional process section It is an item that can be selected according to the actual process. The existing method of adding an optional process section in the process flow is to insert an open point between the required process sections, and insert the optional process section that needs to be added at the position of the open point , but this method of operation will have the following defects. The inserted optional process segment cannot have the authority to set the working status like the required process segment, and after the optional process segment is inserted to establish the process flow, there will often be process segment parameters Conflicts with the parameters of the required process section cause the established process flow to fail to be implemented normally