Method of static scaling of image in holographic lithography
a static scaling and holographic lithography technology, applied in the field of microlithography, can solve the problems of image scaling in the image-forming scale, use of extremely complicated and expensive equipment,
Active Publication Date: 2015-07-02
RAKHOVSKY VADIM
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Benefits of technology
The technical effect of this patent is the use of holographic lithography to solve the problem of image scaling in conventional projection lithography caused by various factors such as masks, equipment, and alignment marks. The holographic lithography allows for static scaling of the image by changing the wavelength of light and using a parametric laser. This results in higher precision and reduced manufacturing costs as compared to conventional lithography. The patent also provides a method to adjust image size by changing the wavelength and utilizing specific mathematical calculations.
Problems solved by technology
One practical problem of conventional projection lithography is possibility of image scaling in the image-forming scale in various sequential operations performed with the use of set of different masks.
Such deviations may be caused also by the use of different mask manufacturing tools, etc.
In order to satisfy precision mask scaling requirements these displacements are carried out with the use of extremely complicated and expensive equipment since such an adjustment involves the use of a set of complicated micro-interferometric devices and tools for micronanopositioning.
Method used
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Embodiment Construction
[0035]In the following detailed description, reference will be made to the accompanying drawing(s), in which identical functional elements are designated with like numerals. The aforementioned accompanying drawings show by way of illustration, and not by way of limitation, specific embodiments and implementations consistent with principles of the present invention. These implementations are described in sufficient detail to enable those skilled in the art to practice the invention and it is to be understood that other implementations may be utilized and that structural changes and / or substitutions of various elements may be made without departing from the scope and spirit of present invention. The following detailed description is, therefore, not to be construed in a limited sense. Additionally, the various embodiments of the invention as described may be implemented in the form of a software running on a general purpose computer, in the form of a specialized hardware, or combinatio...
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Abstract
Proposed is a method of static scaling of an image in holographic lithography. The method consists of generating a final virtual digital hologram of the original pattern through a sequence of mathematical calculations with participation of a virtual coherent light source having a predetermined wavelength λ1 and producing an actual hologram on the basis of the virtual digital hologram of the original pattern. The obtained hologram can be used for forming an actual original pattern in a predetermined size. When it is necessary to produce the original pattern in another size, this can be done by static scaling by merely selecting another wavelength for the laser source with adjustable wavelength. The method allows determining the wavelength range in which scalability is possible with substantially homotetic transformation of the image.
Description
CROSS-REFERENCE TO RELATED PATENT APPLICATION[0001]The present U.S. patent application relies upon, claims the benefit of priority from, and is a continuation-in-part of U.S. patent application Ser. No. 14 / 142,778 filed on Dec. 28, 2013, the entire disclosure of which is incorporated by reference herein.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to the semiconductor industry, in particular, to microlithography, and more specifically to a method of static scaling of an image in holographic lithography.[0004]2. Description of the Related Art[0005]Lithography and, in particular, photolithography is a well-known technique in semiconductor and printed circuit board (PCB) manufacture for creating electrical components and circuits. Predominantly, used for this purpose is projection photolithography, which involves projecting a mask image on the surface of a substrate, which has been covered by a layer of photoresist, before exposing both ...
Claims
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IPC IPC(8): G03H1/08G03H1/16B29C48/08
CPCG03H1/0891G03H2001/0816G03H1/16G03H1/0808G03H1/0005G03H2001/0094G03H2222/13B29C48/08B29C48/0018Y02E60/10H01M10/052
Inventor RAKHOVSKY, VADIMBORISOV, MIKHAILSHAMAEV, ALEKSEYCHELYUBEEV, DMITRYGAVRIKOV, ALEKSANDRCHERNIK, VITALYMIKHEEV, PETER
Owner RAKHOVSKY VADIM
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