3 results about "Alloy thin film" patented technology

A process for metalizing a ceramic surface or attaching a ceramic to a metal is provided. The process may comprise: immersing the ceramic into an aluminum or aluminum alloy melt, making the ceramic move or stay still relative to the melt to adhere the melt to the ceramic; and then removing the ceramic from the melt to unaffectedly cool the film adhered thereto. The process can attach an aluminum or aluminum alloy thin film having a thickness of several to tens of micrometers on a ceramic surface. The thin film is formed by solidification, and does not have microscopic faults such as oxide film inclusions or pores, therefore having proper physical of mechanical properties of aluminum. Ceramics or a ceramic and a metal can be brazed via the surface metalizing film, the bonding strength of their interface can over the strength of aluminum itself.This invention discloses a process for metalizing the surface of a ceramic and a process for attaching a ceramic to a metal. A process for attaching an aluminum or aluminum alloy thin film to a ceramic surface comprises the steps of: immersing a ceramic surface to be metalized into a aluminum or aluminum alloy melt, and making the ceramic move or stay still relative to the melt to adhere the melt of the aluminum or aluminum alloy to the metalizing surface of the ceramic; and then removing the metalizing surface of the ceramic from the melt to unaffectedly cool the aluminum or aluminum alloy liquid film adhered thereto to obtain a ceramic having the aluminum or aluminum alloy thin film attached to the surface. The process to attaching aluminum or aluminum alloy thin film on the surface of a ceramic of the present invention can attach an aluminum or aluminum alloy thin film having a thickness of several micrometers to tens of micrometers on the surface of a ceramic. The thin film is formed by the solidification of the aluminum of aluminum alloy liquid film attached on the surface of a ceramic, and it does not have the microscopic faults such as oxide film inclusions or pores, therefore having the proper physical of mechanical properties of aluminum. Ceramics or a ceramic and a metal can be brazed via the surface metalizing film, the bonding strength of their interface can over the strength of aluminum itself.

The invention discloses a pulse laser deposition based preparation method of a phase change film. The method is based on pulse laser deposition equipment, and comprises the following steps that under a vacuum condition, lasers are used for irradiating a rotary target material to carry out pre-targeting, and then a Ge2Sb2Se4Te1 film is deposited on a rotary silicon substrate. According to the method, the novel phase change material Ge2Sb2Se4Te1 is prepared through pulsed laser deposition, it is guaranteed that all elements in the alloy film are in a quite ideal component ratio, the refractive index change condition of the Ge2Sb2Se4Te1 in the gradual phase change process is achieved through annealing at the specific temperature and the specific time, the goodness value FOM is equal to 5.2 at the position of 1550 nm, the goodness value is the ratio of the change of the refractive index to the change of the extinction coefficient before and after phase change, and the phase change performance of the phase change material is reflected. For the novel phase change material Ge2Sb2Se4Te1 prepared based on pulsed laser deposition, the morphology change before and after phase change and the lattice structure under the crystalline state condition are researched, the change condition of the chemical attitude of the elements before and after phase change is analyzed, and the phase change mechanism of Ge2Sb2Se4Te1 is disclosed.

The invention discloses a high-entropy alloy film on the surface of a barrel inner bore and a preparation method of the high-entropy alloy film. A barrel inner bore base body is sequentially subjected to ultrasonic cleaning and plasma cleaning; a plasma sputtering method is adopted, and a WMoTaNb layer is deposited on the surface of the body tube inner bore base body subjected to plasma cleaning based on a WMoTaNb target; a plasma sputtering method is adopted, and a WMoTaNbSi gradient transition layer is deposited on the WMoTaNb layer on the basis of the WMoTaNb target and the Si target; a plasma sputtering method is adopted, a WMoTaNbSi layer is deposited on the WMoTaNbSi gradient transition layer on the basis of a WMoTaNb target and a Si target, and a high-entropy alloy film is obtained; the high-entropy alloy film is prepared on the surface of the inner bore to replace an original Cr coating, the high-entropy alloy film has the advantages of being high in melting point, low in heat conductivity, high in hardness, resistant to abrasion, good in high-temperature stability and the like, the problems that a traditional electroplating Cr coating is prone to generating thermal stress cracks and the like can be solved, and then the service life of the barrel is prolonged.