Method for forming fuse structure
一种熔丝结构、多晶硅熔丝的技术,应用在半导体工艺领域,能够解决损坏内部电路、介质层总厚度大、无法精确控制厚度等问题,达到避免损伤的效果
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[0030] In the formation process of the fuse structure, in order to improve the reliability of the device, it is necessary to effectively control the thickness of the dielectric layer remaining above the fuse structure. The present invention forms a first dielectric layer with a target thickness above the fuse structure, and An etch stop layer is formed on the first dielectric layer, so that the etching process during the opening formation process stops automatically at the etch stop layer, thereby effectively controlling the thickness of the remaining dielectric layer above the fuse structure and preventing the fuse structure from being blown. Lateral expansion can cause damage to the circuit.
[0031] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0032] In the following description, spe...
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