Preparation method of silicon dioxide used for tooth paste
一种二氧化硅、牙膏的技术,应用在氧化硅等方向,能够解决粉尘劳动成本增加、牙膏摩擦剂磨蚀量和增稠性能不能同时达到使用要求、不能作为摩擦剂使用等问题,达到好增稠性的效果
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Embodiment 1
[0028] (1) Add water to the raw material sodium silicate to make 500g of 15%wt sodium silicate solution based on silicon dioxide, add water to sulfuric acid to make 225g of 20%wt sulfuric acid aqueous solution, first add 112.5g of sulfuric acid aqueous solution to the reaction kettle, At room temperature, add sodium silicate solution at a rate of 150 g / min, and stop adding sodium silicate when the pH of the reaction end point is 7. Raise the temperature to 80°C for 1 hour.
[0029] (2) Add the remaining sodium silicate solution to step (1), heat up to 80°C, then add sulfuric acid aqueous solution at a rate of 150g / min, stop adding acid until the pH of the reaction end point is 4, stir and keep warm for 30 minutes
[0030] (3) Filter and wash the reaction material until the sodium ion content of the product is below 0.2%wt, and beat the filter cake for 1 hour.
[0031] (4) Dehydration and drying by flash drying; the dried product is crushed to an average particle size of 10 mi...
Embodiment 2
[0034] (1) Add water to the raw material sodium silicate to form 500g of 18%wt sodium silicate solution based on silicon dioxide, add water to sulfuric acid to prepare 270g of 20%wt sulfuric acid aqueous solution, first add 135g of sulfuric acid aqueous solution to the reaction kettle, At room temperature, add sodium silicate solution at a rate of 200 g / min, and stop adding sodium silicate when the pH of the reaction end point is 7. Raise the temperature to 80°C for 1 hour.
[0035] (2) Add the remaining sodium silicate solution into step (1), raise the temperature to 80°C, then add sulfuric acid aqueous solution at a rate of 200g / min, stop adding acid until the pH of the reaction end point is 4, stir and keep warm for 30 minutes
[0036] (3) Filter and wash the reaction material until the sodium ion content of the product is below 0.2%wt, and beat the filter cake for 1 hour.
[0037] (4) Dehydration and drying by flash drying; the dried product is crushed to an average parti...
Embodiment 3
[0039] (1) Add water to the raw material sodium silicate to prepare 500g of 20%wt sodium silicate solution based on silicon dioxide, add water to sulfuric acid to prepare 200g of 30%wt sulfuric acid aqueous solution, first add 100g of sulfuric acid aqueous solution to the reaction kettle, At room temperature, add sodium silicate solution at a rate of 300 g / min, and stop adding sodium silicate when the pH of the reaction end point is 7. Raise the temperature to 70°C for 2 hours.
[0040] (2) Add the remaining sodium silicate solution into step (1), raise the temperature to 70°C, then add sulfuric acid aqueous solution at a rate of 300g / min, stop adding acid until the reaction end point is PH4, stir and keep warm for 30 minutes
[0041] (3) Filter and wash the reaction material until the sodium ion content of the product is below 0.2%wt, and beat the filter cake for 1 hour.
[0042] (4) Dehydration and drying by flash drying; the dried product is crushed to an average particle ...
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