High-hardness and high-elasticity-modulus multi-component nitride coating and preparation method thereof

[0023] Preparation, characterization and measuring instruments used in the present invention:

[0024] JGP-450 Magnetron Sputtering System, Shenyang Scientific Instrument Development Center Co., Ltd., Chinese Academy of Sciences

[0025] D8 Advance X-ray diffractometer, Bruker, Germany

[0026] NANO Indenter G200 nanoindenter, Agilent Technologies, USA

[0027] Tecnai G 2 Model 20 high-resolution transmission electron microscope, FEI, USA

[0028] Quanta FEG450 scanning electron microscope (with Oxford energy spectrometer), American FEI company

[0030] A method for preparing a multi-component nitride coating with high hardness and high elastic modulus, comprising the steps of:

[0031] 1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning, during which the substrate is packed Into the sample chamber, vacuum to 5*10 -3 After Pa, open Ar gas, maintain the vacuum at 2-4Pa, use 13.56Hz (intermediate frequency) radio frequency to bombard the substrate with ions for 20-40min, and the power is 80-100W; the substrate is Cu.

[0032] 2) Using a multi-target magnetron sputtering apparatus, the step of magnetron sputtering reaction deposition is carried out on the substrate by an AlCrTiZrNb alloy target with an equal atomic molar ratio; the cleaned substrate is placed in a multi-target magnetron sputtering apparatus and left Before the AlCrTiZrNb alloy target material, the above-mentioned magn...

[0035] A method for preparing a multi-component nitride coating with high hardness and high elastic modulus, comprising the steps of:

[0036] 1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning, during which the substrate is packed Into the sample chamber, vacuum to 5*10 -3 After Pa, open Ar gas, maintain the vacuum degree at 2-4Pa, use 13.56Hz radio frequency to carry out ion bombardment on the substrate for 20-40min, and the power is 80-100W; the substrate is Al.

[0037] 2) Using a multi-target magnetron sputtering apparatus, the step of magnetron sputtering reaction deposition is carried out on the substrate by an AlCrTiZrNb alloy target with an equal atomic molar ratio; the cleaned substrate is placed in a multi-target magnetron sputtering apparatus and left Before the AlCrTiZrNb alloy target, the above-mentioned magnetron sputtering...