The invention provides a preparation method of a parallel-arranged SiO2
nanowire. In the whole process of the method, SiO nanopowder is used as a reaction source, and reacts in a high temperature zoneof a one-dimensional high temperature tubular furnace under a
low vacuum environment, and is deposited on a low temperature zone of a
silicon wafer substrate along with the circulation of a protective gas. The method has high yield, simple operation, safety and
environmental protection, and low cost, has no need to add a catalyst, and can be completed by a
chemical reaction at a high temperature.The SiO2
nanowire prepared by the method has a
parallel arrangement structure, and the unique novel structure has important academic significance and application for developing new fields of materialproperties.